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Tetrakis(dimethylamino)tin(IV) TDMASn 四(二甲氨基)錫

規格: 99.5%(99.9999%-Sn）
CAS: 1066-77-9
產品編號: H49275
MDL: MFCD00014860
品牌: INFI

ALD簡介

   原子層沉積技術(Atomic Layer Deposition，簡稱ALD)是一種在納米尺度上進行薄膜沉積的先進技術。通過將物質以單原子形式一層一層的鍍在基底表面，擁有優異的三維共形性、大面積成膜的均勻性和精確控制膜厚等特點。

ALD應用

ALD在能源領域應用

2009年，Miyaska課題組將鈣鈦礦材料MAPbI3用作燃料敏化太陽能電池的光伏活性層，正式開啟了鈣鈦礦太陽能電池的新紀元。ALD憑借其均勻成膜性、精準控制厚度和保形性等多種優勢，在光伏領域中發揮著重要作用。除此之外，ALD技術還可用于鋰電池薄膜涂層，提高電池性能。

ALD在泛半導體應用

隨著泛半導體行業的發展，對微型化和集成化要求越來越高，尺寸縮小至亞微米和納米量級，ALD作為一種高精度薄膜沉積技術，可用于晶體管柵極電介質層(高K材料)、金屬柵電極、有機發光顯示器涂層、銅互聯擴散阻擋層、DRAM電介質層、微流體和MEMS涂層、傳感器等眾多領域。

ALD在光學領域應用

由于 ALD 具有的三維共形沉積和大面積均勻性特點，已成功應用于高質量光學薄膜、增透膜、折射率可調的光學薄膜、波狀多層膜，改善了光子晶體的光學性質和可控性，增加了光子晶體在未來光學器件中的應用潛力。

 公司致力于ALD高純半導體薄膜前驅體材料的自主研發和生產，成立以來，已陸續向多家半導體客戶提供了百余種前驅體新材料，包括高純硅基前驅體系列、High-k前驅體系列產品，部分新品已被客戶用于5nm以下制程薄膜設備。我們致力為客戶提供優質的產品并建立互信、長久的合作關系，產品具有自主知識產權且原材料國產化，打破國外壟斷的同時保證供應鏈的安全。研峰科技愿與國內芯片、高端顯示、光伏新能源等高端客戶一起攜手，解決高端半導體材料的把脖子難題，早日實現進口替代。




Chemical NameTetrakis(dimethylamido)tin(IV)
Synonym Tin(IV) dimethylamide tetrakis-(dimethylamino-)-stannane Tetrakis-(dimethylamino)-zinn Tetrakis(dimethylamino)stannane 四(二甲氨基)錫 Tetrakis(dimethylamino)tin
MDL NumberMFCD00014860
CAS Number1066-77-9
Chemical Name Translation四(二甲基氨基)錫(IV)
InChIKeyWHXTVQNIFGXMSB-UHFFFAOYSA-N
PubChem Substance ID16684220
LabNetwork Molecule IDLN01253175
InChIInChI=1S/4C2H6N.Sn/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
GHS Symbol
WGK Germany3
Precautionary statements
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 遠離熱源/火花/明火/熱的表面。——禁止吸煙。
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或醫生/醫師。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防護手套/防護服/眼睛的保護物/面部保護物。
  • P305+P351+P338
    Hazard statements
    • H314 Causes severe skin burns and eye damage 導致嚴重的皮膚灼傷和眼睛損傷
    • H332 Harmful if inhaled 吸入有害
    • H225 Highly flammable liquid and vapour 高度易燃液體和蒸氣
    • H312 Harmful in contact with skin 皮膚接觸有害
    • H302 Harmful if swallowed 吞食有害
    • H302+H312+H332
      Hazard Codes F,C F;C
      Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US)
      Signal word Danger
      Safety Statements
      • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接觸后，立即用大量水沖洗并征求醫生意見；
      • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴適當的防護服、手套和眼睛/面保護；
      • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 發生事故時或感覺不適時，立即求醫（可能時出示標簽）；
      • S16 Keep away from sources of ignition - No smoking 遠離火源，禁止吸煙；
        Risk Statements
        • R11 Highly flammable 非常易燃
        • R20/21/22 Harmful by inhalation, in contact with skin and if swallowed 吸入、皮膚接觸和不慎吞咽有害
        • R34 Causes burns 會導致灼傷
          UN Number 2924
          Restrict 危險品
        • {uni_hamburg} Short: II/25D
        • Title: Structure Data of Free Polyatomic Molecules: Molecules Containing Five or More Carbon Atoms
        • Author: Graner, G.; Hirota, E.; Iijima, T.; Kuchitsu, K.; Ramsay, D.A.; Vogt, J.; Vogt, N.
        • Editor: Kuchitsu, K.
        • Source: Landolt-B?rnstein, New Series
        • Volume: II/25D
        • Year: 2003
        • Keyword: Free Polyatomic Molecules; Carbon Atoms; Molecules
        • ISBN: 3-540-42860-7
        • ISBN: 978-3-540-42860-2
        • Internet Resource: DOI:10.1007/b75952
        • RefComment: VIII, 569 pages. Hardcover
        • RefComment: Written for scientists and researchers in the fields of chemistry and physics
        • Abstract: This fourth subvolume presents data on the geometric parameters (internuclear distances, bond angles, dihedral angles of internal rotation etc) of free polyatomic molecules including free radicals and molecular ions. The survey on structure data consists of four subvolumes, each containing the geometric parameters determined in the gas phase either by an analysis of the rotational constants (and sometimes the vibrational constants) obtained from microwave, infrared, Raman, electronic and photoelectron spectroscopy or by an analysis of electron diffraction intensities. Most of the structures listed in the tables are for molecules in the electronic ground state, but structures for electronically excited states have also been included as far as they are available. In this fourth subvolume, the structure of molecules containing five to sixty carbon atoms is listed.
        • {uni_hamburg} Short: III/38A
        • Title: Refractive Indices of Inorganic, Organometallic, and Organononmetallic Liquids and Binary Liquid Mixtures
        • Author: Wohlfarth, Ch.; Wohlfarth, B.
        • Editor: Lechner, M.D.
        • Source: Landolt-B?rnstein, New Series
        • Volume: III/38A
        • Year: 1996
        • Keyword: organicmetallic compounds; inorganic compounds; refractive index; liquids; mixtures
        • ISBN: 3-540-60539-8
        • ISBN: 978-3-540-60539-3
        • Internet Resource: DOI:10.1007/b55612
        • RefComment: VII, 400 pages, Hardcover
        • Abstract: Volume III/38 Optical Constants provides critical
          • 1066-77-9 H49275 Tetrakis(dimethylamino)tin(IV) TDMASn 四(二甲氨基)錫
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          化學屬性

          Mol. FormulaC8H24N4Sn
          Mol. Weight295.01
          Flash Point-8 ºC
          Density1.0
          Appearance colorless to pale-yellow liq.
          Stabilitymoisture sensitive
          Boiling Point51°C (0.1mm)
          Danger-Level-
          pH-:-
          Redox-

          *以上化合物性質及應用等信息僅供參考